van Berkum, Tess (2018) Electron beam sensitivity of mica. Bachelor's Thesis, Applied Physics.
|
Text
bAppP_2018_vanBerkumT.pdf Download (49MB) | Preview |
|
![[img]](https://fse.studenttheses.ub.rug.nl/style/images/fileicons/text.png) |
Text
toestemming.pdf Restricted to Registered users only Download (97kB) |
Abstract
Mica is a mineral that has a naturally flat surface with basal and outstanding cleavage, which makes it a good substrate for high quality film growth. In order to study the structure of these thin layers different geometries can be examined by (scanning) transmission electron microscopy ((S)TEM), namely plan-view and cross-section geometries. In this paper a dual beam system is used for preparing TEM-lamellas. The goal of the experiment is to investigate the electron beam sensitivity of mica when it is viewed in cross-section by a (S)TEM. It was found that mica has a certain electron dose threshold in order to conclude if it is damaged or not. The threshold lies in the electron dose range of $4.1 * 10^{-7}$ pC/$\mu$m$^2$ and $8.6 * 10^{-7}$ pC/$\mu$m$^2$ by 30 kV electrons. Furthermore an observation was made that the diffraction patterns vanish inhomogeneously, the out-plane lines decrease earlier than the in-plane lines when the electron dose increases. An equation of a sigmoidal logistic function, $y = A2 + (A1-A2)/(1 + (x./x0)^p)$, is found to express the vanishing of in-plane diffraction lines when the electron dose increases. The benefit of controlling the electron beam damage of mica is that the study of thin layers can be improved.
| Item Type: | Thesis (Bachelor's Thesis) |
|---|---|
| Supervisor name: | Momand, J. and Kooi, B.J. and Palasantzas, G. |
| Degree programme: | Applied Physics |
| Thesis type: | Bachelor's Thesis |
| Language: | English |
| Date Deposited: | 03 Dec 2018 |
| Last Modified: | 03 Dec 2018 12:57 |
| URI: | https://fse.studenttheses.ub.rug.nl/id/eprint/18875 |
Actions (login required)
 |
View Item |