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Optimal Control in EUV Lithography Lens Models

Dijk, Stefan van (2023) Optimal Control in EUV Lithography Lens Models. Master's Thesis / Essay, Applied Mathematics.

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De begeleider en/of auteur heeft geen toestemming gegeven tot het openbaar maken van de scriptie. The supervisor and/or the author did not authorize public publication of the thesis.

Item Type: Thesis (Master's Thesis / Essay)
Supervisor name: Trenn, S. and Peypouquet, J.G.
Degree programme: Applied Mathematics
Thesis type: Master's Thesis / Essay
Language: English
Date Deposited: 24 Feb 2023 15:15
Last Modified: 24 Feb 2023 15:15

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