Lin, Jhe-An (2024) Atomic Layer Deposition of HfO2 Thin Films and HfO2-TiO2 Multilayers: Ferroelectric and Memristive Properties. Master's Thesis / Essay, Nanoscience.
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Abstract
De begeleider en/of auteur heeft geen toestemming gegeven tot het openbaar maken van de scriptie. The supervisor and/or the author did not authorize public publication of the thesis.
| Item Type: | Thesis (Master's Thesis / Essay) |
|---|---|
| Supervisor name: | Noheda, B. |
| Degree programme: | Nanoscience |
| Thesis type: | Master's Thesis / Essay |
| Language: | English |
| Date Deposited: | 20 Aug 2024 11:28 |
| Last Modified: | 20 Aug 2024 11:28 |
| URI: | https://fse.studenttheses.ub.rug.nl/id/eprint/34005 |
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