Salih, Melav (2020) Energetic Tin Ions Traversing Hydrogen Gas: SRIM Simulation of Transmitted Ions. Bachelor's Thesis, Applied Physics.
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Abstract
With the minimization of the size of chips in devices, new techniques are needed to provide the next step in the manufacturing process. An important step is the use of EUV light sources. Modern intense EUV light sources for lithography are based on a tin plasma in which highly charged tin ions are the atomic sources of 13.5nm EUV light. However, high energy tin ions coming from the plasma can damage the collector mirror inside the source chamber. Hydrogen gas under low pressures is used to reduce the impact. This thesis provides insight into the stopping powers and ranges of tin ions, with energies of 0.1keV, 1keV, and 10keV, in hydrogen gas using simulations with the program package SRIM. Furthermore, the angle of transmitted ions and energy spectrum are plotted over different target depths of hydrogen gas to observe the scattering angle and their respective shifts in the energy spectrum.
Item Type: | Thesis (Bachelor's Thesis) |
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Supervisor name: | Hoekstra, R.A. and Schlatholter, T.A. |
Degree programme: | Applied Physics |
Thesis type: | Bachelor's Thesis |
Language: | English |
Date Deposited: | 27 Jul 2020 12:59 |
Last Modified: | 27 Jul 2020 12:59 |
URI: | https://fse.studenttheses.ub.rug.nl/id/eprint/22880 |
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